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Reliability Wearout Mechanisms in Advanced CMOS Technologies - Alvin W. Strong, Ernest Y. Wu, Rolf-Peter Vollertsen, Jordi Suné, Giuseppe LaRosa, Stewart E. Rauch, III, Timothy D. Sullivan
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Alvin W. Strong, Ernest Y. Wu, Rolf-Peter Vollertsen, Jordi Suné, Giuseppe LaRosa, Stewart E. Rauch, III, Timothy D. Sullivan:

Reliability Wearout Mechanisms in Advanced CMOS Technologies - edition reliée, livre de poche

2009, ISBN: 9780471731726

It is the first book of its kind to bring together the pertinent physics, equations, and procedures for CMOS technology reliability in one place. Divided into six relatively independent t… Plus…

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Reliability Wearout Mechanisms in Advanced CMOS Technologies - Strong, Alvin W.|Wu, Ernest Y.|Vollertsen, Rolf-Peter|Sune, Jordi|La Rosa, Giuseppe|Sullivan, Timothy D.|Rauch, Stewart E.
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Strong, Alvin W.|Wu, Ernest Y.|Vollertsen, Rolf-Peter|Sune, Jordi|La Rosa, Giuseppe|Sullivan, Timothy D.|Rauch, Stewart E.:

Reliability Wearout Mechanisms in Advanced CMOS Technologies - edition reliée, livre de poche

2009, ISBN: 0471731722

[EAN: 9780471731726], Neubuch, [PU: Wiley & Sons|Wiley-IEEE Press], TECHNOLOGY & INDUSTRIAL ARTS ENGINEERING ELECTRICAL TECHNIK ELEKTRONIK ELEKTROTECHNIK NACHRICHTENTECHNIK TECHNISCHE ZUV… Plus…

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Reliability Wearout Mechanisms in Advanced CMOS Technologies - Alvin W. Strong Ernest Y. Wu Rolf-Peter Vollertsen Jordi Sune Giuseppe La Rosa Timothy D. Sullivan Stewart E. Rauch
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Alvin W. Strong Ernest Y. Wu Rolf-Peter Vollertsen Jordi Sune Giuseppe La Rosa Timothy D. Sullivan Stewart E. Rauch:
Reliability Wearout Mechanisms in Advanced CMOS Technologies - Première édition

2009

ISBN: 9780471731726

Edition reliée

[ED: Gebunden], [PU: John Wiley & Sons], ALVIN W. STRONG, PhD, is retired from IBM in Essex Junction, Vermont. He holds nineteen patents, has authored or coauthored a number of papers, an… Plus…

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Strong, Alvin W, and Wu, Ernest Y, and Vollertsen, Rolf-Peter:
Reliability Wearout Mechanisms in Advanced Cmos Technologies - edition reliée, livre de poche

2009, ISBN: 9780471731726

Hard cover, New Book Original US edition, Perfect Condition. Printed in English. Excellent Quality, Service and customer satisfaction guaranteed., Brand New, [PU: Wiley-IEEE Press]

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Reliability Wearout Mechanisms in Advanced CMOS Technologies - Alvin W. Strong; Ernest Y. Wu; Rolf-Peter Vollertsen; Jordi Sune; Giuseppe La Rosa
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Alvin W. Strong; Ernest Y. Wu; Rolf-Peter Vollertsen; Jordi Sune; Giuseppe La Rosa:
Reliability Wearout Mechanisms in Advanced CMOS Technologies - edition reliée, livre de poche

2009, ISBN: 9780471731726

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Reliability Wearout Mechanisms in Advanced CMOS Technologies

A comprehensive treatment of all aspects of CMOS reliability wearout mechanisms This book covers everything students and professionals need to know about CMOS reliability wearout mechanisms, from basic concepts to the tools necessary to conduct reliability tests and analyze the results. It is the first book of its kind to bring together the pertinent physics, equations, and procedures for CMOS technology reliability in one place. Divided into six relatively independent topics, the book covers: * Introduction to Reliability * Gate Dielectric Reliability * Negative Bias Temperature Instability * Hot Carrier Injection * Electromigration Reliability * Stress Voiding Chapters conclude with practical appendices that provide very basic experimental procedures for readers who are conducting reliability experiments for the first time. Reliability Wearout Mechanisms in Advanced CMOS Technologies is ideal for students and new engineers who are looking to gain a working understanding of CMOS technology reliability. It is also suitable as a professional reference for experienced circuit design engineers, device design engineers, and process engineers.

Informations détaillées sur le livre - Reliability Wearout Mechanisms in Advanced CMOS Technologies


EAN (ISBN-13): 9780471731726
ISBN (ISBN-10): 0471731722
Version reliée
Livre de poche
Date de parution: 2009
Editeur: Wiley-IEEE Press
624 Pages
Poids: 0,980 kg
Langue: eng/Englisch

Livre dans la base de données depuis 2007-07-05T07:08:40+02:00 (Zurich)
Page de détail modifiée en dernier sur 2024-03-08T15:28:43+01:00 (Zurich)
ISBN/EAN: 0471731722

ISBN - Autres types d'écriture:
0-471-73172-2, 978-0-471-73172-6
Autres types d'écriture et termes associés:
Auteur du livre: rosa peter, guiseppe, peter rauch, stewart, peter spain, rosa giuseppe, vollertsen rolf, volle, strong, vollert
Titre du livre: cmos technologie, reliability for the technologies, series advanced, reliability wearout mechanisms advanced cmos technologies


Données de l'éditeur

Auteur: Alvin W. Strong; Ernest Y. Wu; Rolf-Peter Vollertsen; Jordi Sune; Giuseppe La Rosa; Timothy D. Sullivan; Stewart E. Rauch
Titre: IEEE Press Series on Microelectronic Systems; Reliability Wearout Mechanisms in Advanced CMOS Technologies
Editeur: John Wiley & Sons
624 Pages
Date de parution: 2009-09-04
Poids: 0,966 kg
Langue: Anglais
165,00 € (DE)
No longer receiving updates
164mm x 238mm x 33mm

BB; gebunden; Hardcover, Softcover / Technik/Elektronik, Elektrotechnik, Nachrichtentechnik; Schaltkreise und Komponenten (Bauteile); Quality & Reliability; Schaltkreise - Theorie u. Entwurf; Circuit Theory & Design; Qualität u. Zuverlässigkeit; Schaltkreise - Theorie u. Entwurf / VLSI / ULSI; Electrical & Electronics Engineering; CMOS; Schaltkreistechnik; Circuit Theory & Design / VLSI / ULSI; Technische Zuverlässigkeit; Elektrotechnik u. Elektronik; Qualität u. Zuverlässigkeit; Schaltkreise - Theorie u. Entwurf; Schaltkreise - Theorie u. Entwurf / VLSI / ULSI

A comprehensive treatment of all aspects of CMOS reliability wearout mechanisms This book covers everything students and professionals need to know about CMOS reliability wearout mechanisms, from basic concepts to the tools necessary to conduct reliability tests and analyze the results. It is the first book of its kind to bring together the pertinent physics, equations, and procedures for CMOS technology reliability in one place. Divided into six relatively independent topics, the book covers: * Introduction to Reliability * Gate Dielectric Reliability * Negative Bias Temperature Instability * Hot Carrier Injection * Electromigration Reliability * Stress Voiding Chapters conclude with practical appendices that provide very basic experimental procedures for readers who are conducting reliability experiments for the first time. Reliability Wearout Mechanisms in Advanced CMOS Technologies is ideal for students and new engineers who are looking to gain a working understanding of CMOS technology reliability. It is also suitable as a professional reference for experienced circuit design engineers, device design engineers, and process engineers.

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