EXEMPLE
Jain, Pushkar:Tantalum Oxide Thin Films for Embedded Capacitors - Using Pulsed DC Reactive Sputtering
- Livres de poche 2008, ISBN: 9783639096620
[ED: Taschenbuch / Paperback], [PU: VDM Verlag Dr. Müller], Embedded capacitor technology, where thin film
capacitors are integrated at on-chip and/or off-chip
levels, offers high packa… Plus…
[ED: Taschenbuch / Paperback], [PU: VDM Verlag Dr. Müller], Embedded capacitor technology, where thin film
capacitors are integrated at on-chip and/or off-chip
levels, offers high packaging densities and improved
electrical performance at potentially reduced costs
of capacitor fabrication and integration. This
research explores and establishes the leverages of
using thin film embedded capacitors over currently
used surface mount discrete capacitors. In
particular, this work focuses on developing pulsed
dc reactively sputtered tantalum oxide (Ta2O5) thin
film capacitors for IC chips and packages. A design
space for breakdown voltage and capacitance density
of planar capacitors is established, with film
thickness and material dielectric constant as
parameters. The validity of the developed design
space is experimentally verified with Ta2O5 thin
films over a wide range of film thickness. An
experimentally verified analytical model for pulsed
dc reactive sputtering of Ta2O5 films is described
and evaluated. Various processing and integration
challenges in depositing thin films using reactive
sputtering and their effects on electrical
performance of thin-film capacitors are discussed., DE, [SC: 0.00], Neuware, gewerbliches Angebot, 212, [GW: 288g], Selbstabholung und Barzahlung, PayPal, offene Rechnung, Banküberweisung, Internationaler Versand<
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Jain Pushkar:Tantalum Oxide Thin Films for Embedded Capacitors
- nouveau livre 2008, ISBN: 9783639096620
Embedded capacitor technology, where thin film capacitors are integrated at on-chip and/or off-chip levels, offers high packaging densities and improved electrical performance at potentia… Plus…
Embedded capacitor technology, where thin film capacitors are integrated at on-chip and/or off-chip levels, offers high packaging densities and improved electrical performance at potentially reduced costs of capacitor fabrication and integration. This research explores and establishes the leverages of using thin film embedded capacitors over currently used surface mount discrete capacitors. In particular, this work focuses on developing pulsed dc reactively sputtered tantalum oxide (Ta2O5) thin film capacitors for IC chips and packages. A design space for breakdown voltage and capacitance density of planar capacitors is established, with film thickness and material dielectric constant as parameters. The validity of the developed design space is experimentally verified with Ta2O5 thin films over a wide range of film thickness. An experimentally verified analytical model for pulsed dc reactive sputtering of Ta2O5 films is described and evaluated. Various processing and integration challenges in depositing thin films using reactive sputtering and their effects on electrical performance of thin-film capacitors are discussed. Using Pulsed DC Reactive Sputtering Buch (dtsch.) Taschenbuch 01.10.2008 Bücher>Sachbücher>Naturwissenschaften & Technik>Ingenieurwissenschaft & Technik, VDM, .200<
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(*) Livre non disponible signifie que le livre est actuellement pas disponible à l'une des plates-formes associées nous recherche.
Jain Pushkar:Tantalum Oxide Thin Films for Embedded Capacitors
- nouveau livre ISBN: 9783639096620
Embedded capacitor technology, where thin film capacitors are integrated at on-chip and/or off-chip levels, offers high packaging densities and improved electrical performance at potentia… Plus…
Embedded capacitor technology, where thin film capacitors are integrated at on-chip and/or off-chip levels, offers high packaging densities and improved electrical performance at potentially reduced costs of capacitor fabrication and integration. This research explores and establishes the leverages of using thin film embedded capacitors over currently used surface mount discrete capacitors. In particular, this work focuses on developing pulsed dc reactively sputtered tantalum oxide (Ta2O5) thin film capacitors for IC chips and packages. A design space for breakdown voltage and capacitance density of planar capacitors is established, with film thickness and material dielectric constant as parameters. The validity of the developed design space is experimentally verified with Ta2O5 thin films over a wide range of film thickness. An experimentally verified analytical model for pulsed dc reactive sputtering of Ta2O5 films is described and evaluated. Various processing and integration challenges in depositing thin films using reactive sputtering and their effects on electrical performance of thin-film capacitors are discussed. Using Pulsed DC Reactive Sputtering Buch (dtsch.) Bücher>Sachbücher>Naturwissenschaften & Technik>Ingenieurwissenschaft & Technik, VDM<
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Pushkar Jain:Tantalum Oxide Thin Films for Embedded Capacitors
- Livres de poche ISBN: 9783639096620
Paperback, [PU: VDM Verlag Dr. Mueller E.K.], Embedded capacitor technology, where thin film capacitors are integrated at on-chip and/or off-chip levels, offers high packaging densities a… Plus…
Paperback, [PU: VDM Verlag Dr. Mueller E.K.], Embedded capacitor technology, where thin film capacitors are integrated at on-chip and/or off-chip levels, offers high packaging densities and improved electrical performance at potentially reduced costs of capacitor fabrication and integration. This research explores and establishes the leverages of using thin film embedded capacitors over currently used surface mount discrete capacitors. In particular, this work focuses on developing pulsed dc reactively sputtered tantalum oxide (Ta2O5) thin film capacitors for IC chips and packages. A design space for breakdown voltage and capacitance density of planar capacitors is established, with film thickness and material dielectric constant as parameters. The validity of the developed design space is experimentally verified with Ta2O5 thin films over a wide range of film thickness. An experimentally verified analytical model for pulsed dc reactive sputtering of Ta2O5 films is described and evaluated. Various processing and integration challenges in depositing thin films using reactive sputtering and their effects on electrical performance of thin-film capacitors are discussed., Biochemical Engineering<
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Tantalum Oxide Thin Films for Embedded Capacitors
- Livres de poche2008, ISBN: 9783639096620
Embedded capacitor technology, where thin film capacitors are integrated at on-chip and/or off-chip levels, offers high packaging densities and improved electrical performance at potentia… Plus…
Embedded capacitor technology, where thin film capacitors are integrated at on-chip and/or off-chip levels, offers high packaging densities and improved electrical performance at potentially reduced costs of capacitor fabrication and integration. This research explores and establishes the leverages of using thin film embedded capacitors over currently used surface mount discrete capacitors. In particular, this work focuses on developing pulsed dc reactively sputtered tantalum oxide (Ta2O5) thin film capacitors for IC chips and packages. A design space for breakdown voltage and capacitance density of planar capacitors is established, with film thickness and material dielectric constant as parameters. The validity of the developed design space is experimentally verified with Ta2O5 thin films over a wide range of film thickness. An experimentally verified analytical model for pulsed dc reactive sputtering of Ta2O5 films is described and evaluated. Various processing and integration challenges in depositing thin films using reactive sputtering and their effects on electrical performance of thin-film capacitors are discussed. Buch (dtsch.) Jain Pushkar Taschenbuch, VDM, 01.10.2008, VDM, 2008<
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